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Nondestructive, high-resolution, chemically specific 3D nanostructure characterization using extreme ultraviolet, coherent diffractive imaging reflectometry

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Abstract

A grand challenge in semiconductor metrology has been the nondestructive characterization 3D nanostructures and their multilayer structure, interfaces, and dopant concentrations. We combine extreme ultraviolet reflectometry with state-of-the-art ptychography imaging algorithms to achieve this goal.

© 2023 The Author(s)

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