A new process to deposit AlF3 thin films

Bo-Huei Liao; Ming-Chung Liu; Cheng-Chung Lee

doi:10.1364/OIC.2007.MB5

Optical Interference Coatings
OSA Technical Digest (CD) (Optica Publishing Group, 2007),
paper MB5
•https://doi.org/10.1364/OIC.2007.MB5

A new process to deposit AlF₃ thin films

Bo-Huei Liao, Ming-Chung Liu, and Cheng-Chung Lee

Optical Interference Coatings 2007

Tucson, Arizona United States
3–8 June 2007
ISBN: 1-55752-841-1

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Manufacturing Problem / Deposition of Coatings II (MB)

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B. Liao, M. Liu, and C. Lee, "A new process to deposit AlF3 thin films," in Optical Interference Coatings, OSA Technical Digest (CD) (Optica Publishing Group, 2007), paper MB5.

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Abstract

Aluminum fluoride thin films have been deposited by magnetron sputtering of aluminum target with CF₄ as working gas at room temperature. The AlF₃ thin film coated at 20W sputtering power has the best quality.

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