Improving the Optical Properties of Al2O3 by Plasma Etching Deposition

Bo-Huei Liao; Cheng-Chung Lee

doi:10.1364/OIC.2010.MD5

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper MD5
•https://doi.org/10.1364/OIC.2010.MD5

Improving the Optical Properties of Al₂O₃ by Plasma Etching Deposition

Bo-Huei Liao and Cheng-Chung Lee

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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B. Liao and C. Lee, "Improving the Optical Properties of Al2O3 by Plasma Etching Deposition," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper MD5.

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Abstract

Fluorine doped Al₂O₃ films have been deposited by plasma etching deposition of aluminum target with various CF₄/O₂ gas at room temperature. The film coated with 0.243 CF₄/O₂ ratio has best optical properties.

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