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Gas cluster ion beam process for high-quality thin film deposition

Noriaki Toyoda and Isao Yamada

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Abstract

Gas cluster ion beam (GCIB) realizes ultra-low energy ion irradiations and high-density of energy deposition at the near surface. Fluoride films and amorphous carbon films were deposited with GCIB assisted depositions, and film properties and surface planarization effects are discussed.

© 2010 Optical Society of America

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