Abstract
Ta2O5 is a suitable high-index material for thermal resistive thin film applications, such as a component of reflector mirrors for projectors. Melting of Ta2O5 tablets by electron beam gun shows often the dissociation of starting Ta2O5 materials and gives rise of O2 level during its melting. It is, therefore, necessary to continue a long time premelting process to get sufficient low oxygen level or stable vacuum pressure before starting appropriate deposition of Ta2O5 films. It requires not only disadvantageous long process time, but also it starts again endless oxygen outlet from the insufficiently melt parts of Ta2O5 when electric power applied to electron beam gun increases towards higher level for deposition. This results inevitably unstable deposition process and hence unstable refractive indices of Ta2O5 films obtained up to now.
© 1992 Optical Society of America
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