Abstract

Reactive low voltage ion plating (RLVIP) produces dielectric thin films of excellent quality with dense, glassy microstructure and smooth surface, thus featuring low bulk and surface light scattering. The dense structure also prevents moisture penetration and consequential spectral shift of transmission or reflectance characteristics. Hence, these films seem to be well suited for laser applications. However, earlier results showed a somewhat disappointing laser induced damage threshold (LIDT), lower than that of electron beam deposited thin films of the same material. This investigation aims at a better understanding of the underlying mechanism for the lower LIDT in RLVIP thin films and tries to identify effects introduced by chemical composition (suspected small sub-stoichiometry) or localized growth defects (perhaps sub-micron-size metal or sub-oxide clusters).

© 1992 Optical Society of America