Abstract

It is well known that plasma-deposited silicon and silicon nitride thin films provide great characteristics for optical coatings in various applications (1-5). Since films prepared by plasma-enhanced CVD are homogeneous, durable, and also reproducible, it is very appropriate to design a multilayer stack which consists of alternating a-Si and a-SiNx layers. We present our study on this topic in the following sections.

© 1992 Optical Society of America