Abstract

Plasma assisted CVD techniques are increasingly important in semiconductor and wear resistant tool fabrication. Although the CVD process has the potential of low fabrication costs, applications in the optical coating field, however, are still rare up to now. The reason is mainly the limited layer thickness uniformity. This situation has changed now. In this paper we present a plasma impulse CVD (PICVD) process, which is capable of producing high quality optical layers at moderate costs.

© 1992 Optical Society of America