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Conferences > DFM > 1995 > S > S19
  • Applications of Diamond Films and Related Materials: Third International Conference
  • Technical Digest Series (Optica Publishing Group, 1995),
  • paper S19

Amorphous Hard Boron Nitride Films Prepared by Plasma Enhanced Chemical Vapor Deposition

Hidetoshi Saitoh, Jun Satoh, Takashi Ishiguro, Kiichiro Kamata, and Yukio Ichinose

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Abstract

Amorphous boron nitride films were prepared on Si substrates by plasma enhanced chemical vapor deposition with a BCl3-N2-Ar-H2 gas mixture. The surface of the resulting films indicated a Knoop hardness of 60000-80000 N/mm2 at a loading force of 100 mN. Scratching test revealed that the critical load of the boron nitride films was higher than that of diamond like carbon films prepared on Si substrates.

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