Abstract

Metal was introduced to CH₄/H₂ rf plasma. Effects of metals both on the quality of diamond films and on the gas phase reaction were investigated. Most metals depressed the diamond deposition, compared with the case without additive, while Si and Ti did not. Graphitic carbon deposited together with diamond on the addition of Fe, Ni or Mo. Most metals (except for Ti and Pd) deposited in the form of carbide immediately after the introduction into the plasma. The band A cathodoluminescence was observed for all diamond films with and without additive. Si and Ni promoted the conversion of CH₄ to c₂h_x (x = 0–6) however they did not facilitate the deposition of diamond.

© 1995 Optical Society of America