Abstract

Diamond films were deposited by pulse modulated magnetoactive microwave plasma chemical vapor deposition (CVD). Dependence of the deposition rate on the modulation frequency showed a drastic peaking at 500 Hz. Methyl radical (CH₃) density in the pulse modulated plasma was measured by infrared laser absorption spectroscopy. Optical emission spectroscopy was also carried out to investigate the behavior of atomic hydrogen in the plasma. Time averaged CH₃ density was also enhanced by the pulse modulation, however, the observed behaviors of CH₃ radical density was not sufficient for explanation of the deposition rate.

© 1995 Optical Society of America