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Conferences > CLEOPR > 2001 > TuB2 > TuB2_1
  • The 4th Pacific Rim Conference on Lasers and Electro-Optics
  • Technical Digest Series (Optica Publishing Group, 2001),
  • paper TuB2_1

157nm-248nm Multiwavelength Excitation Processing for Application in Optoelectronic Manufacturing

Kotaro Obata, Koji Sugioka, Toshimitsu Akane, Naoko Aoki, Koichi Toyoda, and Katsumi Midorikawa

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Abstract

Simultaneous irradiation of F2 and KrF excimer lasers was demonstrated for high-quality ablation and photo-sensitivity of fused silica. Micropatterns were formed on fused silica by both the etching and the refractive index modification with little surface damage.

© 2001 IEEE

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