Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
  • 2000 International Quantum Electronics Conference
  • Technical Digest Series (Optica Publishing Group, 2000),
  • paper QThD58

157, 193 and 248 nm Structural Damage of the DNA and RNA Bases

Not Accessible

Your library or personal account may give you access

Abstract

Dissociation dynamics of the RNA and DNA bases, thymine, cytosine, adenine and guanine with vacuum ultraviolet (VUV) and ultraviolet (UV) radiation, is of particular interest due to the availability of excimer lasers at 193 and 248nm. The value of the absorption coefficient of the four bases in the UV is of the order of 104 cm−1 and therefore the one photon absorption probability is very high. At these wavelengths the complete breaking of the chemical bonds of the bases Is taking place. The parent molecules disintegrate to small photofragments, atomic, diatomic or triatomic, which are flying apart with supersonic speed. In this communication we report therefore on the the mass spectroscopic characteristics of the DNA and RNA bases at 157, 193 and 248 nm, using the F2, ArF and KrF pulsed discharge lasers. Mass spectroscopic studies reveal that even at low laser energy of 0.5 mJ and energy fluence of 0.2mJ/cm2, there is a complete breaking of the chemical bonds at these wavelengths. For 157 and 193 nm only photofragments with the ratio of m/e lower than 30 amu (atomic mass units of m/e) were observed. The molecular photofragments from the photodissociation of the parent monomer were observed mainly between 20 and 30 amu. Photofragments with two carbon and nitrogen atoms have a relatively higher probability to be dissociated from the parent monomer, than heavier photofragments with four carbon atoms. The DNA and RNA bases dissociate into fragments with the predominant mass at 28 amu for both laser wavelengths. This is a rather common response for molecules having the amide group [1], Therefore the amide group is mainly involved in the photodissociation process at least for wavelengths shorter than 248 nm. In addition, fast hydrogen atoms do trigger cross linking reactions between neighbouring molecules [2]; hence additional damage of the DNA and RNA bases is taking place.

© 2000 IEEE

PDF Article
More Like This
Photoresist Polymeric Materials for 157nm Photolithography

E. Sarantopoulou, A. C. Cefalas, E. Gogolides, and P. Argitis
CTuO2 The European Conference on Lasers and Electro-Optics (CLEO/Europe) 2000

A simple and practical 157nm and 193 nm coherent light source

Xiaoshi Zhang, Hsia-Hua Liu, Dirk Müller, and Sterling Backus
CWI5 Conference on Lasers and Electro-Optics (CLEO:S&I) 2008

Intrinsic Birefringence in 193 nm and 157 nm Lithography Crystalline Optics

John H. Burnett
OTuC3 Optical Fabrication and Testing (OF&T) 2002

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.