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In Situ Ellipsometric Monitoring of a Dielectric Multilayer Edge Filter

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Abstract

Computer programs have been developed to the stage where they are capable of producing optical thin film designs of 100 layers or more to meet the most demanding performance specification. A measured result of such a design is the edge filter shown in Fig. 1 where a reflectance step from 100% at 680nm to 5% at 666nm is produced.

© 1998 Optical Society of America

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