Abstract

Reactive Low-Voltage Ion Plating (RLVIP) is increasingly used as the method of choice for the production of dense, environmentally stable optical coatings.¹ The operational details of this process, including system geometry, plasma voltages and currents have been published elsewhere.^2,3 As with other plasma based methods, understanding the exact physics and chemistry of this complex process requires a very thorough and detailed analysis. One of the most important questions in the application of this process for the deposition of refractory oxide coatings is the nature and the role of the main oxidizing agent.

© 1992 Optical Society of America