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  • 2000 International Quantum Electronics Conference
  • Technical Digest Series (Optica Publishing Group, 2000),
  • paper QWE3

Writing a chromium superlattice with light forces

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Abstract

In atom lithography the conventional roles played by light and matter are reversed: a mask of light is used to pattern a beam of neutral atoms. Up to now, atom lithography has yielded only structures periodic in one or two dimensions, with a typical period of λ/2 or even below [1]. Here we report the generation of various chromium structures with quadratic symmetry and the first realization of a superlattice structure using light forces [2].

© 2000 IEEE

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