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Optica Publishing Group
  • International Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 1998),
  • paper QTuG21

Two-dimensional light force lithography with polarization gradient fields

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Abstract

Using neutral atoms for lithography is a new method of generating nanostructures on a substrate. This method is based on light masks formed by interfering laser beams perpendicular to the atomic beam. One- and two-dimensional periodic structures have been fabricated by various groups1-5 using light masks with intensity gradients and uniform polarization. The resulting periods are half the laser wavelength or greater.

© 1998 Optical Society of America

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