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Optica Publishing Group
  • International Quantum Electronics Conference
  • 1996 OSA Technical Digest Series (Optica Publishing Group, 1996),
  • paper MC4

Writing nanostructures with chromium and helium beams

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Abstract

It is of considerable technological interest how new processes for nanofabrication can be used to go beyond resolution limits of optical lithography. The requirements for such new techniques are high resolution, parallel writing and the possibility to form aperiodic structures.

© 1996 Optical Society of America

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