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Conferences > CLEO_Europe > 2021 > ck_8 > ck_8_3
  • 2021 Conference on Lasers and Electro-Optics Europe and European Quantum Electronics Conference
  • OSA Technical Digest (Optica Publishing Group, 2021),
  • paper ck_8_3

High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits

Junqiu Liu, Guanhao Huang, Rui Ning Wang, Jijun He, Arslan S. Raja, Johann Riemensberger, Grigory Lihachev, Nils J. Engelsen, and Tobias J. Kippenberg

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Abstract

For widespread applications of nonlinear photonic integrated circuits, ultralow optical losses and high fabrication throughput are required. Here, we present a CMOS fabrication technique for photonic microresonators with mean quality factors exceeding 30 millions and wafer-level yield.

© 2021 IEEE

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