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Conferences > CLEO_SI > 2021 > STu2Q > STu2Q.2

High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits

Junqiu Liu, Guanhao Huang, Rui Ning Wang, Jijun He, Arslan S. Raja, Tianyi Liu, Nils J. Engelsen, and Tobias J. Kippenberg

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Abstract

For widespread applications of nonlinear photonic integrated circuits, ultralow optical losses and high fabrication throughput are required. Here, we present a CMOS fabrication technique for photonic microresonators with mean quality factors exceeding 30 millions and wafer-level yield.

© 2021 The Author(s)

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High-yield, wafer-scale fabrication of ultralow-loss, dispersion-engineered silicon nitride photonic circuits

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