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Conferences > CLEO_Europe > 1998 > CThH > CThH111

High Precision Phase Mask Without Stitching Error

J. J. Pan, Y. Shi, and F. Q. Zhou

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Abstract

Phase mask (PM) is proved to be one of the most versatile techniques for massive production of FBGs for different applications [1]. FBG parameters can be controlled by designing control of PM's parameters. In this paper, PM production technique using precision e-beam writing and reactive ion-milling (RIM) techniques with advantages of stitching error-free and accurate period.

© 1998 IEEE

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