Abstract

EUV coherent scatterometry microscopy (CSM) systems has been developed. The CSM system employs a high-order harmonic generation (HHG) 13.5 nm coherent source to detect pattern defects and measure the CD of patterns. The resolution of pattern defects and repeatability of CD measurement are 20 nm and 0.1 nm, respectively.

© 2013 Optical Society of America

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