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Actinic Mask Inspection System Using HHG EUV Source

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Abstract

A coherent scatterometry microscope (CSM) has been developed, in which high-order harmonic generation (HHG) is employed to produce coherent 13.5 nm light. The HHG-CSM is used to inspect absorber pattern defects and phase defects.

© 2018 The Author(s)

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