Abstract
Optical properties of an optically-controlled MOSFET using Si substrate has been demonstrated at 1.55 μm wavelength light. The current of MOSFET is modulated by the electric-field induced by photo-generated carriers in the absorption region whose structure is consisted of the p-i-n diode.1-3 This device is possible of high speed operation compared to direct optical control FET4 using photo-generated carriers in the channel as a modulation current.
© 1995 IEEE
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