Abstract

Pulsed laser deposition method has a significant advantage for crystal growth of thin-film oxides in surroundings of oxygen. Therefore, it has been used extensively as an electronic film growth technique for high-quality, high-T_c superconductors. Recently, it has been a hot topic also for fabrication of optical thin films. By the way, thin-film structures of solid-state lasers such as neodymium-doped yttrium aluminum garnet (YAG), have gained great interest, because thin-film structures of such solid-state lasers are very attractive for waveguide lasers and integrated optics. If such thin-film structures of solid-state lasers are fabricated by the above pulsed laser deposition, the scheme becomes much more interesting because pulsed laser deposition would be a unique technique for in-situ processing unlike conventional crystal growth techniques. Therefore, we have proposed that the pulsed laser deposition could be a promising method to fabricate Nd:YAG thin films. In this study, we have grown by the pulsed laser deposition of Nd: Y₃A1₅O₁₂ (Nd: YAG) thin films on various substrates.

© 1995 IEEE