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Nd:Y3Al5O12 (YAG) thin films have been attractive for waveguide lasers, because their thin-film structures can realize optical confinement, its consequent low-threshold oscillation, and high pump/amplification. These thin-film structures have been fabricated by He implantation1 and liquid-phase epitaxy.2 Recently, pulsed-laser deposition has been studied extensively as an electronic film-growth technique for high-quality, high-Tc superconductors.3 The fabrication of optical thin films by pulsed-laser deposition is a topic of great interest. If Nd:YAG thin films could be fabricated by the method, this scheme would become much more interesting because pulsed-laser deposition would be a unique technique for in situ processing.
© 1995 Optical Society of America
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