Low-loss grating coupler with a subwavelength structure on a thin-film lithium niobate substrate

Jing Huang; Nuo Chen; Kaizhong Chen; Tao Chu

doi:10.1364/OL.509999

Optics Letters
Vol. 49,
Issue 2,
pp. 222-225
(2024)
•https://doi.org/10.1364/OL.509999

Low-loss grating coupler with a subwavelength structure on a thin-film lithium niobate substrate

Jing Huang, Nuo Chen, Kaizhong Chen, and Tao Chu

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Jing Huang, Nuo Chen, Kaizhong Chen, and Tao Chu, "Low-loss grating coupler with a subwavelength structure on a thin-film lithium niobate substrate," Opt. Lett. 49, 222-225 (2024)

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- Optical Devices
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About this Article
History
- Original Manuscript: October 20, 2023
- Revised Manuscript: December 2, 2023
- Manuscript Accepted: December 3, 2023
- Published: January 1, 2024

Abstract

We demonstrated a low-loss O-band grating coupler on an x-cut thin-film lithium niobate substrate by implementing subwavelength and apodized structures. The subwavelength gratings were used to mitigate the refractive index discontinuity between the input taper and grating region, which was the first application of such a structure for grating coupler optimization on a thin-film lithium niobate substrate. The coupling efficiency was measured to be −1.99 dB/coupler at a wavelength of 1312.8 nm, which was the lowest loss among the reported lithium niobate grating couplers that do not use metal mirrors. The proposed design does not require metal mirrors or any additional material layers and can be easily fabricated with a single-step lithography and etching processes.

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The data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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W₁ (nm)	W₂ (nm)	W₃ (nm)	W₄ (nm)	W₅ (nm)	W₆ (nm)	W₇ (nm)	W₈ (nm)
486	356	415	514	504	497	478	480
P₁(nm)	P₂(nm)	P₃(nm)	P₄(nm)	P₅(nm)	P₆(nm)	P₇(nm)	P₈(nm)
641	658	726	749	747	749	740	747
W₉(nm)	W_u1(nm)	W_u2(nm)	W_SWG1(nm)	W_SWG2(nm)	W_SWG3(nm)	N₁	N₂
505	505	519	345	280	200	6	12
P₉(nm)	P_u1(nm)	P_u2(nm)	P_SWG(nm)	e(nm)	T_Cladding(nm)	θ(°)	CE(dB)
729	724	701	500	240	1400	2.3	−1.00

Ref.	Structure	Reflector	Hybrid Material	CE (dB)	Operating Band
[6]	Chirped	Yes	No	−1.43	C-band
[7]	Uniform	Yes	No	−0.89	C-band
[8]	Uniform	No	α-Si	−3.06	C-band
[9]	Uniform	No	Si3N4	−4.02	C-band
[10]	Uniform	No	Au	−3.56 (TE)−4.08 (TM)	C-band
[11]	Uniform	No	poly-Si	−2.20 (TM)	C-band
[12]	Chirped	No	No	−3.60	C-band
[13]	Apodized	No	No	−3.48−3.27	775 nmC-band
This Work	Apodized with SWGs	No	No	−1.99	O-band

W₁ (nm)	W₂ (nm)	W₃ (nm)	W₄ (nm)	W₅ (nm)	W₆ (nm)	W₇ (nm)	W₈ (nm)
486	356	415	514	504	497	478	480
P₁(nm)	P₂(nm)	P₃(nm)	P₄(nm)	P₅(nm)	P₆(nm)	P₇(nm)	P₈(nm)
641	658	726	749	747	749	740	747
W₉(nm)	W_u1(nm)	W_u2(nm)	W_SWG1(nm)	W_SWG2(nm)	W_SWG3(nm)	N₁	N₂
505	505	519	345	280	200	6	12
P₉(nm)	P_u1(nm)	P_u2(nm)	P_SWG(nm)	e(nm)	T_Cladding(nm)	θ(°)	CE(dB)
729	724	701	500	240	1400	2.3	−1.00

Ref.	Structure	Reflector	Hybrid Material	CE (dB)	Operating Band
[6]	Chirped	Yes	No	−1.43	C-band
[7]	Uniform	Yes	No	−0.89	C-band
[8]	Uniform	No	α-Si	−3.06	C-band
[9]	Uniform	No	Si3N4	−4.02	C-band
[10]	Uniform	No	Au	−3.56 (TE)−4.08 (TM)	C-band
[11]	Uniform	No	poly-Si	−2.20 (TM)	C-band
[12]	Chirped	No	No	−3.60	C-band
[13]	Apodized	No	No	−3.48−3.27	775 nmC-band
This Work	Apodized with SWGs	No	No	−1.99	O-band

Abstract

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Figures (8)

Tables (3)

Equations (2)

Optics Letters