Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

The formation of a lateral-shearing interferogram when reproducing a double-exposure Gabor hologram

Not Accessible

Your library or personal account may give you access

Abstract

No abstract available.

PDF Article
More Like This
Determination of the laser beam quality factor (M2) by stitching quadriwave lateral shearing interferograms with different exposures

Zhi-Gang Han, Ling-Qiang Meng, Zhe-Qiang Huang, Hua Shen, Lei Chen, and Ri-Hong Zhu
Appl. Opt. 56(27) 7596-7603 (2017)

Method for Evaluating Lateral Shearing Interferograms

M. P. Rimmer
Appl. Opt. 13(3) 623-629 (1974)

Multiplexing Double Exposure Holographic Interferograms

H. J. Caulfield
Appl. Opt. 11(11) 2711-2712 (1972)

Cited By

You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.

Contact your librarian or system administrator
or
Login to access Optica Member Subscription

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.