Abstract

We present the design and fabrication of metasurface-type patterned wave plates for VIS applications. The metasurface consists of a grating structure with periods much smaller than the addressed wavelength. By using character projection e-beam lithography for the fabrication, various shapes, orientations, sizes, and patterns can be realized within affordable exposure times. For the first demonstration, a pattern with different orientations of the grating ridges of quarter-wave plates for 532 nm wavelength is presented.

© 2019 Optical Society of America

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