Abstract
HfO2 and SiO2 single layer is deposited on glass substrate with plasma ion
assistance provided by Leybold advanced plasma source (APS). The deposition is
performed with a bias voltage in the range of 70-130 V for HfO2, and 70-170 V for
SiO2. Optical, structural, mechanical properties, as well as absorption and laser
induced damage threshold at 1064 nm of HfO2 and SiO2 single layer deposited with the
plasma ion assistance are systematically investigated. With the increase of APS bias
voltage, coatings with higher refractive index, reduced surface roughness, and
higher laser-induced damage threshold (LIDT) are obtained, and no significant change
of the absorption at 1064 nm is observed. For HfO2, a bias voltage can be identified
to achieve coatings without any stress. However, too-high bias voltage can cause the
increase of surface roughness and stress, and decrease the LIDT. The bias voltage
can be properly identified to achieve coatings with desired properties.
© 2011 Chinese Optics Letters
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