Abstract
A novel angle-resolved scatterometer based on pupil optimization for feature
profile measurement in a photolithography process is proposed. The impact of image
sensor errors is minimized by optimizing the intensity distribution of the incident
light using a spatial light modulator. The scatterometry sensitivity of feature
measurement at different polarization conditions is calculated using the rigorous
coupled-wave and first-order analyses, and the reproducibility of the scatterometer
is evaluated. The results show that the sensitivity and reproducibility of the
angle-resolved scatterometer increase by 90% and 40% with pupil optimization,
respectively.
© 2012 Chinese Optics Letters
PDF Article
More Like This
Cited By
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an Optica member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Login to access Optica Member Subscription