Planar polishing process method based on real-time dressing of a polishing pad surface

Lingyu Zhao; Huiying Zhao; Hairong Wang; Mingjie Zhang; Ruiqing Xie; Ruiqing Xie; Mingzhuang Zhang

doi:10.1364/AO.450614

Applied Optics
Vol. 61,
Issue 12,
pp. 3319-3327
(2022)
•https://doi.org/10.1364/AO.450614

Planar polishing process method based on real-time dressing of a polishing pad surface

Lingyu Zhao, Huiying Zhao, Hairong Wang, Mingjie Zhang, Ruiqing Xie, and Mingzhuang Zhang

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Lingyu Zhao, Huiying Zhao, Hairong Wang, Mingjie Zhang, Ruiqing Xie, and Mingzhuang Zhang, "Planar polishing process method based on real-time dressing of a polishing pad surface," Appl. Opt. 61, 3319-3327 (2022)

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Abstract

Planar polishing is an important manufacturing process for high-precision planar components. In this study, a real-time dresser and a planar polishing process based on real-time dressing for large-aperture optical plane components were developed. Efficient dressing of a polishing pad surface can be achieved with the real-time dresser. Compared with the conventional method, real-time correction for the surface shape of the polishing pad was realized via the temperature parameter $t$ in the real-time dresser, and this parameter can be optimized through optimization experiments. Finally, a series of experiments was carried out to verify the effectiveness of the real-time dresser on surface dressing. Through the real-time dressing of the polishing pad surface, the flatness peak–valley deviation and the root-mean-square deviation of the flat optical element surface (${{430}} \times {{430}}\;{\rm{mm}}$) can reach ${{3}}\;\lambda$ and ${0.9}\;\lambda$, which is improved by 25% and 33%, respectively.

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Data availability

Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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Name	Function
Supporting structure	Support for all components
Turntable	Drives the polishing pad to rotate 360° around the $c$ axis
Workpiece shaft	Drives the optical component to rotate 360° around the $s 1$ axis
Multi-function dressing shaft	Includes: turning tool, polishing pad surface turning dressing, milling tool, polishing pad surface grooving
Real-time dresser	Real-time correction of the surface shape for the polishing pad

	Process Parameters
Level	Coolant Temperature ( $t$ )	Angular Speed of the Turntable ( $ω$ )	Polishing Pressure ( $p$ )
1	$t_{1}$ (16°C)	$ω_{1}$ (0.84 rad/s)	$p_{1}$ (1.2 kPa)
2	$t_{2}$ (18°C)	$ω_{2}$ (0.42 rad/s)	$p_{2}$ (2.4 kPa)
3	$t_{3}$ (20°C)	$ω_{3}$ (1.26 rad/s)	$p_{3}$ (4.8 kPa)

	Process Parameters			Experimental Results ( $λ = 632 n m$ )
No.	$t$	$ω$	$p$	PV ( $λ$ )	RMS ( $λ$ )
1	$t_{1}$	$ω_{1}$	$p_{1}$	4.316	1.163
2	$t_{1}$	$ω_{2}$	$p_{2}$	0.801	0.182
3	$t_{1}$	$ω_{3}$	$p_{3}$	1.293	0.283
4	$t_{2}$	$ω_{1}$	$p_{2}$	2.660	0.666
5	$t_{2}$	$ω_{2}$	$p_{3}$	0.753	0.168
6	$t_{2}$	$ω_{3}$	$p_{1}$	1.397	0.335
7	$t_{3}$	$ω_{1}$	$p_{3}$	1.996	0.467
8	$t_{3}$	$ω_{2}$	$p_{1}$	0.844	0.190
9	$t_{3}$	$ω_{3}$	$p_{2}$	1.299	0.293

	$t$		$ω$		$p$
	PV	RMS	PV	RMS	PV	RMS
${\bar{K}}_{ij}$	6.41	0.54	8.97	0.76	6.55	0.56
${\bar{K}}_{ij}$	4.81	0.38	2.39	0.54	4.76	0.38
${\bar{K}}_{ij}$	4.14	0.31	3.98	0.91	4.04	0.30
$R_{i}$	2.27	0.23	6.57	0.37	2.52	0.26

	Process Parameters			Experimental Results ( $λ = 632 n m$ )
No.	$t$	$ω$	$p$	PV ( $λ$ )	RMS ( $λ$ )
1	$t_{3}$	$ω_{2}$	$p_{3}$	0.743	0.161

Abstract

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Applied Optics