Abstract

The Free Electron Laser has been proposed as a source to extend projection lithography to even greater resolution[1]. The envisioned high power, coherence and wavelength tunabality of these sources make the FEL a welcome radiation source to overcome some of the limitation with optics and resist technology that plague the current sources. The narrow line width imposed by the FEL should generate a steeper step in resist. Moreover, the higher power should allow us to explore regions in the resist once currently of reach.

© 1993 Optical Society of America