Limits of Ultra Violet Lithography

R. Fabian Pease

doi:10.1364/SXRAY.1993.MB.1

Soft X-Ray Projection Lithography
Technical Digest Series (Optica Publishing Group, 1993),
paper MB.1
•https://doi.org/10.1364/SXRAY.1993.MB.1

Limits of Ultra Violet Lithography

R. Fabian Pease

Soft X-Ray Projection Lithography 1993

California United States
10–12 May 1993
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R. F. Pease, "Limits of Ultra Violet Lithography," in Soft X-Ray Projection Lithography, Technical Digest Series (Optica Publishing Group, 1993), paper MB.1.

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Abstract

Any new technology must offer significant improvement over an entrenched technology to become adopted. Here we describe where ultra-violet lithography might evolve to in ten years time the earliest possible time for soft x-ray lithography to be ready for manufacture.

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