Japanese superresolution lithography

Tsuneo Terasawa; Hiroshi Fukuda; Akira Imai; Shinji Okazaki

doi:10.1364/OAM.1993.MJJ.2

OSA Annual Meeting
Technical Digest Series (Optica Publishing Group, 1993),
paper MJJ.2
•https://doi.org/10.1364/OAM.1993.MJJ.2

Japanese superresolution lithography

Tsuneo Terasawa, Hiroshi Fukuda, Akira Imai, and Shinji Okazaki

OSA Annual Meeting 1993

Toronto Canada
3–8 October 1993
ISBN:

From the session
Symposium on Lithography to the Year 2000: 1 (MJJ)

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T. Terasawa, H. Fukuda, A. Imai, and S. Okazaki, "Japanese superresolution lithography," in OSA Annual Meeting, Technical Digest Series (Optica Publishing Group, 1993), paper MJJ.2.

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Abstract

Lithography is one of the most important microfabrication technologies for ultralarge-scale integrated (ULSI) devices. To improve the resolution of optical lithography, the use of high numerical aperture lenses and shorter wavelength exposure light have been investigated.

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