Light Scatter from Polysilicon Surfaces and Comparison with Surface Roughness Statistics by AFM*

E. J. Bawolek; James B. Mohr; E. D. Hirleman; A. Majumdar

doi:10.1364/SURS.1992.PD2

Surface Roughness and Scattering
Technical Digest Series (Optica Publishing Group, 1992),
paper PD2
•https://doi.org/10.1364/SURS.1992.PD2

Light Scatter from Polysilicon Surfaces and Comparison with Surface Roughness Statistics by AFM^*

E. J. Bawolek, James B. Mohr, E. D. Hirleman, and A. Majumdar

Surface Roughness and Scattering 1992

Tucson, Arizona United States
1–3 June 1992
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E. J. Bawolek, J. B. Mohr, E. D. Hirleman, and A. Majumdar, "Light Scatter from Polysilicon Surfaces and Comparison with Surface Roughness Statistics by AFM*," in Surface Roughness and Scattering, Technical Digest Series (Optica Publishing Group, 1992), paper PD2.

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Abstract

Optical scatter measurements from polysilicon surfaces were performed using 632.8 nm illumination at 45 degrees and 488 nm illumination at 76.8 degrees. Scatter was recorded up to 60 degrees from the specular beam. Results are compared with surface statistics derived from Atomic Force Microscopy (AFM).

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