Abstract

Multilayer-based X-ray optical components call for structures made of smooth and uniform layers with an abrupt interface as well as a high thickness repeatability over many layers. A wide bandpass high energy x-ray reflector illustrates this extreme case where one needs an in-depth graded period multilayer with several hundreds of layers [1]. Thus, in situ characterization techniques are essential to detect thickness fluctuations and are moreover very helpful to optimize the layers. This is the purpose of the two different methods described: grazing X-ray reflectance and optical ellipsometry.

© 1994 Optical Society of America