In-Situ Measurements of the Stability of Conventionally Evaporated and Ion-Assisted Deposited Narrowband Filters

H. Rudigier; H. Schöch

doi:10.1364/OIC.1992.JWC3

Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1992),
paper JWC3
•https://doi.org/10.1364/OIC.1992.JWC3

In-Situ Measurements of the Stability of Conventionally Evaporated and Ion-Assisted Deposited Narrowband Filters

H. Rudigier and H. Schöch

Optical Interference Coatings 1992

Tucson, Arizona United States
1–5 June 1992
ISBN:

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Joint Session on Standards and Stabilization (JWC)

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H. Rudigier and H. Schöch, "In-Situ Measurements of the Stability of Conventionally Evaporated and Ion-Assisted Deposited Narrowband Filters," in Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1992), paper JWC3.

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Abstract

Results of a comparison of the stability of conventionally evaporated and ion-assisted deposited narrowband filters as a function of deposition parameters are presented.

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