Abstract

Correlation of film properties and microstructure with ion beam parameters in ion-assisted deposition (IAD) provides insights for improving IAD thin films. It is well-known that the ion beam energy and ion flux are two main parameters which alter the microstructure of thin films and their optical properties. Parmigiani et al.¹ related the normalized energy, defined as the energy delivered by the bombarding ions per arriving metal atom, to microstructural changes of Ag films in a dual ion-beam sputtering system.

© 1988 Optical Society of America