Abstract

Ionized-Cluster-Beam (ICB) deposition has been applied to form metal, dielectric and compound films for optical coatings. In ICB deposition, it is possible to control the mechanical, crystallographic and optical properties of films by variation of the acceleration voltage and ion content in the total flux. Experimental results of film deposition by ICB show that optical properties can be improved through proper selection of acceleration voltage and ratio of ionization Applications such as high-reflectance mirrors, AR coatings and other optical devices have been demonstrated.

© 1984 Optical Society of America