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Ion-Beam-Assisted Deposition of Optical Films

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Abstract

Substantial modification to the optical properties of vacuum deposited thin films can be made by bombardment of the growing film with ions. The packing density of evaporated dielectric films can be increased from approximately 0.75 to unity thereby producing films which have reproducible, stable properties. The ion-bombardment can also produce changes in the crystal structure and orientation of the films. Enhanced reaction rates and incorporation of the impacting gas in the film are also associated with the process.

© 1984 Optical Society of America

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