Use Of Large Area Cold Cathode Ion Source For Ion Assisted Deposition Of Optical Films

P.R. Denton; A. Musset; B. Singh

doi:10.1364/OIC.1984.ThB4

Third Topical Meeting on Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1984),
paper ThB4
•https://doi.org/10.1364/OIC.1984.ThB4

Use Of Large Area Cold Cathode Ion Source For Ion Assisted Deposition Of Optical Films

P.R. Denton, A. Musset, and B. Singh

Optical Interference Coatings 1984

Monterey, California United States
17–19 April 1984
ISBN:

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Deposition Processes I (ThB)

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P. R. Denton, A. Musset, and B. Singh, "Use Of Large Area Cold Cathode Ion Source For Ion Assisted Deposition Of Optical Films," in Third Topical Meeting on Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1984), paper ThB4.

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Abstract

We report operating characteristics of a large area cold cathode ion source suitable for use in production coaters and present data for ion-assisted deposition of SiO and other optical films.

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