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Conferences > OFT > 2008 > OFA > OFA2
  • Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper OFA2
  • •https://doi.org/10.1364/OFT.2008.OFA2

Enabling Optical Performance on Challenging Materials Via Chemical Mechanical Polishing

Kevin Moeggenborg, Michael White, Stanley Lesiak, Daniel McMullen, and Stan Reggie

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Abstract

Chemical-Mechanical Polishing (CMP) was developed for semiconductor manufacturing to allow rapid, reproducible finishing of varied materials. This paper discusses the benefits and challenges of CMP for finishing of high-quality optical materials.

© 2008 Optical Society of America

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