Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > OFT > 2006 > OFME > OFME6

Advanced Surface Finishing Through the Application of Novel CMP Enabling Technology

Kevin Moeggenborg, John Clark, Jeffrey Gilliland, Stanley Lesiak, Roman Salij, Tamara Vincer, and Alicia Walters

Not Accessible

Your library or personal account may give you access

Abstract

Chemical-Mechanical Polishing (CMP) was developed for semiconductor manufacturing to allow rapid, reproducible polishing of varied materials. This paper discusses benefits and challenges of CMP for optics manufacturing using aluminum mirror polishing as a case study.

© 2006 Optical Society of America

PDF Article
More Like This
Enabling Optical Performance on Challenging Materials Via Chemical Mechanical Polishing

Kevin Moeggenborg, Michael White, Stanley Lesiak, Daniel McMullen, and Stan Reggie
OFA2 Optical Fabrication and Testing (OF&T) 2008

Effects of Various Polishing Conditions on the Surface Finish of Materials

Wase U. Ahmed
TuBB3 Science of Polishing (SOP) 1984

Scattering and Surface Finish of Unconventional Mirror Materials

J. M. Bennett, P. C. Archibald, and A. Klugman
FFB2 Optical Fabrication and Testing (OF&T) 1980

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use