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Conferences > OFC > 1988 > TuB > TuB3

Influence of the preform collapse process on the attenuation of PICVD fibers with pure SiO2 core

H. BAUCH, V. PAQUET, and W. SIEFERT

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Abstract

The plasma impulse chemical vapor deposition (PICVD) process1 Is well suited for the fabrication of preforms by inside deposition. A film with a smoothly profiled refractive index is formed from monolayers generated by plasma pulses. The preparation of pure SiO2 films by PICVD causes no problems due to the special formation mechanism. The optical losses of fibers with a pure SiO2 core show, however, a remarkable dependence on collapsing parameters of the preforms. We report on investigations of losses in SIO2 caused by oxygen incorporation in SiO2.

© 1988 Optical Society of America

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