Abstract
Plasma-impulse CVD (PICVD) is a process for fiber preform fabrication by deposition of extremely thin layers on the inner surface of a glass tube using low-pressure gas discharge pulses. This nonisothermal plasma Is created by microwave pulses (for experimental details see Ref. 1). The pulse duration and repetition rate are adjusted with respect to the gas flow (SiCl4, O2,…) so that the deposition region is completely filled with fresh gas in the time interval between two microwave pulses. During a plasma impulse, which is short compared to the pulse spacing, a glassy layer of molecular thickness is formed.
© 1986 Optical Society of America
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