Determination of the temperature field of flames produced on optical waveguide (OWG) burners is essential to the analysis of SiO2-GeO2 glass formation and deposition processes during OVD. Burner design modifications are reflected in the flame temperature profile and can be related to changes in the OVD deposition efficiency. Highly sensitive laser-based optical techniques can be used to obtain spatially and temporally resolved temperature measurements without perturbing the flame as has been observed when utilizing thermocouple probes. The measurement method which has been investigated at Corning Is thermally assisted fluorescence (THAF) spectroscopy.1 THAF has been used previously to probe premix flames and diffusion jets.2

© 1986 Optical Society of America

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