Abstract
Infrared tunable diode laser absorption studies of process plasmas are being carried out in a laboratory reactor which allows a long absorption path. In this paper we report studies of CF4 and CH4 radio frequency plasmas. The molecular species whose concentrations have been measured include CF2, CF3, and C2F6 as well as CF4 in CF4 plasmas, CH3, CH2, and C2H2 as well as CH4 in methane plasmas. Observations are made for ranges of reactor parameters, including rf power, dilution by Ar or H2, total pressure, and O2 addition. Estimation of the plasma temperature from rotational line absorption intensities is also discussed. Recently, several groups have undertaken detailed chemical kinetic modeling of CF4 and CH4 discharges. The absolute concentrations presented here should be of use in assessing the predictive capabilities of the models.
© 1989 Optical Society of America
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