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Ion-assisted deposition of Al2O3 thin films

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Abstract

Aluminum oxide films have been deposited by ion-assisted deposition. The films were electron beam evaporated at a chamber temperature of 100°C with argon and/or oxygen ion bombardment. The optical constants of these films have been measured in the visible and UV: the refractive index of the films has been increased by the bombardment (to 1.70 at 350 nm), while the extinction coefficients are essentially unchanged (2 × 10−4 at 350 nm). Infrared transmittance measurements in the 3-μm water band show that even an unbombarded Al2O3 film with low refractive index (1.61 at 350 nm) contains virtually no water, indicating a very high packing density. We confirmed this result by observing no air-to-vacuum shift for the same film in a specially equipped spectrophotometer. All the Al2O3 films deposited in this experiment clearly approach unity packing density whether bombarded or not.

© 1987 Optical Society of America

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