Modeling of Al2O3 Thin Film Growth in Modern Ion Coating Processes

M. Turowski; H. Ehlers; K. Heinrich; D. Ristau; D. Ristau

doi:10.1364/OIC.2013.MA.8

Optical Interference Coatings
OSA Technical Digest (online) (Optica Publishing Group, 2013),
paper MA.8
•https://doi.org/10.1364/OIC.2013.MA.8

Modeling of Al₂O₃ Thin Film Growth in Modern Ion Coating Processes

M. Turowski, H. Ehlers, K. Heinrich, and D. Ristau

Optical Interference Coatings 2013

Whistler Canada
16–21 June 2013
ISBN: 978-1-55752-970-1

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Mixed Topics in Optical Coatings (MA)

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M. Turowski, H. Ehlers, K. Heinrich, and D. Ristau, "Modeling of Al2O3 Thin Film Growth in Modern Ion Coating Processes," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optica Publishing Group, 2013), paper MA.8.

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Abstract

Classical molecular dynamics techniques are used for modeling Al₂O₃ thin film growth according to modern ion coating processes. Results for surface roughness and film density dependent on deposition energy are presented.

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